Type

Journal Article

Authors

Kangho Lee
Nina Berner
Hye Kim
Niall Mcevoy
Toby Hallam
Georg Duesberg
Jonathan Coleman

Subjects

Chemistry

Topics
growth mechanism supply transition metal dichalcogenides raman spectroscopy reliable chemical vapour deposition cvd x ray photoelectron spectroscopy electronic components precursor

Transition metal dichalcogenide growth via close proximity precursor supply (2015)

Abstract Reliable chemical vapour deposition (CVD) of transition metal dichalcogenides (TMDs) is currently a highly pressing research field, as numerous potential applications rely on the production of high quality films on a macroscopic scale. Here, we show the use of liquid phase exfoliated nanosheets and patterned sputter deposited layers as solid precursors for chemical vapour deposition. TMD monolayers were realized using a close proximity precursor supply in a CVD microreactor setup. A model describing the growth mechanism, which is capable of producing TMD monolayers on arbitrary substrates, is presented. Raman spectroscopy, photoluminescence, X-ray photoelectron spectroscopy, atomic force microscopy, transmission electron microscopy, scanning electron microscopy and electrical transport measurements reveal the high quality of the TMD samples produced. Furthermore, through patterning of the precursor supply, we achieve patterned growth of monolayer TMDs in defined locations, which could be adapted for the facile production of electronic device components.
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Full list of authors on original publication

Kangho Lee, Nina Berner, Hye Kim, Niall Mcevoy, Toby Hallam, Georg Duesberg, Jonathan Coleman

Experts in our system

1
Kangho Lee
Trinity College Dublin
Total Publications: 11
 
2
Nina C Berner
Trinity College Dublin
Total Publications: 20
 
3
Niall Mcevoy
Trinity College Dublin
Total Publications: 54
 
4
Toby Hallam
Trinity College Dublin
Total Publications: 20
 
5
Georg Duesberg
Trinity College Dublin
Total Publications: 116
 
6
Jonathan Coleman
Trinity College Dublin
Total Publications: 217