Reliable chemical vapour deposition (CVD) of transition metal dichalcogenides (TMDs) is currently a
highly pressing research field, as numerous potential applications rely on the production of high quality
films on a macroscopic scale. Here, we show the use of liquid phase exfoliated nanosheets and patterned
sputter deposited layers as solid precursors for chemical vapour deposition. TMD monolayers were realized
using a close proximity precursor supply in a CVD microreactor setup. A model describing the growth
mechanism, which is capable of producing TMD monolayers on arbitrary substrates, is presented. Raman
spectroscopy, photoluminescence, X-ray photoelectron spectroscopy, atomic force microscopy,
transmission electron microscopy, scanning electron microscopy and electrical transport measurements
reveal the high quality of the TMD samples produced. Furthermore, through patterning of the precursor
supply, we achieve patterned growth of monolayer TMDs in defined locations, which could be adapted for
the facile production of electronic device components.
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Kangho Lee,
Nina Berner,
Hye Kim,
Niall Mcevoy,
Toby Hallam,
Georg Duesberg,
Jonathan Coleman