Type

Journal Article

Authors

E. Oesterschulze
G. Georgiev
K Ludolph
J. Weiner
B. Viaris De Lesegno
G. Gay
Colm O'Dwyer
D. Meschede
U. Rasbach
D. Haubrich
and 2 others

Subjects

Physics

Topics
writing photoionization and excitation atomic nanofabrication microscale domain quantum optics nanometer scale atom lithography

The atom pencil: serial writing in the sub-micrometre domain (2005)

Abstract The atom pencil we describe here is a versatile tool that writes arbitrary structures by atomic deposition in a serial lithographic process. This device consists of a transversely laser-cooled and collimated cesium atomic beam that passes through a 4-pole atom-flux concentrator and impinges on to micron- and sub-micron-sized apertures. The aperture translates above a fixed substrate and enables the writing of sharp features with sizes down to 280 nm. We have investigated the writing and clogging properties of an atom pencil tip fabricated from silicon oxide pyramids perforated at the tip apex with a sub-micron aperture.
Collections Ireland -> University College Cork -> Research Institutes and Centres
Ireland -> University College Cork -> Applied Nanoscience Group - Journal Articles
Ireland -> University College Cork -> Tyndall National Institute
Ireland -> University College Cork -> Applied Nanoscience Group
Ireland -> University College Cork -> Chemistry
Ireland -> University College Cork -> Chemistry - Journal Articles
Ireland -> University College Cork -> College of Science, Engineering and Food Science
Ireland -> University College Cork -> Micro-Nanoelectronics Centre

Full list of authors on original publication

E. Oesterschulze, G. Georgiev, K Ludolph, J. Weiner, B. Viaris De Lesegno, G. Gay, Colm O'Dwyer, D. Meschede, U. Rasbach, D. Haubrich and 2 others

Experts in our system

1
Colm O'Dwyer
University College Cork
Total Publications: 121