Type

Journal Article

Authors

Michael Morris

Subjects

Chemistry

Topics
polymers silicon thin films fabrication poly styrene dry etching poly a plasma etching

Sub-15nm silicon lines fabrication via PS-b-PDMS block copolymer lithography (2013)

Abstract This paper describes the fabrication of nanodimensioned silicon structures on silicon wafers from thin films of a poly(styrene)-block-poly(dimethylsiloxane) (PS-b-PDMS) block copolymer (BCP) precursor self-assembling into cylindrical morphology in the bulk. The structure alignment of the PS-b-PDMS (33 k–17 k) was conditioned by applying solvent and solvothermal annealing techniques. BCP nanopatterns formed after the annealing process have been confirmed by scanning electron microscope (SEM) after removal of upper PDMS wetting layer by plasma etching. Silicon nanostructures were obtained by subsequent plasma etching to the underlying substrate by an anisotropic dry etching process. SEM images reveal the formation of silicon nanostructures, notably of sub-15 nm dimensions.
Collections Ireland -> Trinity College Dublin -> Administrative Staff Authors (Scholarly Publications)
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Full list of authors on original publication

Michael Morris

Experts in our system

1
Michael A. Morris
University College Cork
Total Publications: 164