Type

Journal Article

Authors

Michael A. Morris
Justin D. Holmes
Matthew T Shaw
Ramsankar Senthamaraikannan
Tandra Ghoshal

Subjects

Physics

Topics
thin films arrays pattern formation large scale nanowire fabrication nanowires silicon patterning orientation block copolymers aligned photoelectron spectroscopy

Fabrication of ordered, large scale, horizontally-aligned si nanowire arrays based on an in situ hard mask block copolymer approach. (2013)

Abstract A simple technique is demonstrated to fabricate horizontal, uniform, and hexagonally arranged Sinanowire arrays with controlled orientation and density at spatially well defined locations on a substrate based on an in situ hard-mask pattern-formation approach by microphase-separated block-copolymer thin films. The technique may have significant application in the manufacture of transistor circuitry.
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Full list of authors on original publication

Michael A. Morris, Justin D. Holmes, Matthew T Shaw, Ramsankar Senthamaraikannan, Tandra Ghoshal

Experts in our system

1
Michael A. Morris
University College Cork
Total Publications: 164
 
2
Justin D. Holmes
University College Cork
Total Publications: 287
 
3
Matthew T Shaw
University College Cork
Total Publications: 24
 
4
Ramsankar Senthamaraikannan
University College Cork
Total Publications: 12
 
5
Tandra Ghoshal
University College Cork
Total Publications: 32