Type

Journal Article

Authors

Michael A. Morris
Justin D. Holmes
Yordan M Georgiev
Nikolay Petkov
John O'Connell
Dipu Borah
Roisin A Kelly
Anushka Gangnaik
Cian Cummins

Subjects

Chemistry

Topics
silicon nanowires copolymers semiconductor devices block copolymer self assembly metal solvent vapor annealing surface interfaces pattern transfers directed assembly poly a poly styrene metallic compounds oxide block copolymers hydrogen silsequioxane directed self assembly critical dimension self assembly metal oxide nanowires styrene

Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer. (2015)

Abstract 'Directing' block copolymer (BCP) patterns is a possible option for future semiconductor device patterning, but pattern transfer of BCP masks is somewhat hindered by the inherently low etch contrast between blocks. Here, we demonstrate a 'fab' friendly methodology for forming well-registered and aligned silicon (Si) nanofins following pattern transfer of robust metal oxide nanowire masks through the directed self-assembly (DSA) of BCPs. A cylindrical forming poly(styrene)-block-poly(4-vinyl-pyridine) (PS-b-P4VP) BCP was employed producing 'fingerprint' line patterns over macroscopic areas following solvent vapor annealing treatment. The directed assembly of PS-b-P4VP line patterns was enabled by electron-beam lithographically defined hydrogen silsequioxane (HSQ) gratings. We developed metal oxide nanowire features using PS-b-P4VP structures which facilitated high quality pattern transfer to the underlying Si substrate. This work highlights the precision at which long range ordered ∼10 nm Si nanofin features with 32 nm pitch can be defined using a cylindrical BCP system for nanolithography application. The results show promise for future nanocircuitry fabrication to access sub-16 nm critical dimensions using cylindrical systems as surface interfaces are easier to tailor than lamellar systems. Additionally, the work helps to demonstrate the extension of these methods to a 'high χ' BCP beyond the size limitations of the more well-studied PS-b-poly(methyl methylacrylate) (PS-b-PMMA) system.
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Full list of authors on original publication

Michael A. Morris, Justin D. Holmes, Yordan M Georgiev, Nikolay Petkov, John O'Connell, Dipu Borah, Roisin A Kelly, Anushka Gangnaik, Cian Cummins

Experts in our system

1
Michael A. Morris
University College Cork
Total Publications: 164
 
2
Justin D. Holmes
University College Cork
Total Publications: 287
 
3
Yordan M. Georgiev
University College Cork
Total Publications: 20
 
4
Nikolay Petkov
University College Cork
Total Publications: 64
 
5
John O'Connell
University College Cork
Total Publications: 26
 
6
Dipu Borah
University College Cork
Total Publications: 17
 
7
Roisin A Kelly
University College Cork
Total Publications: 10
 
8
Anushka S. Gangnaik
University College Cork
Total Publications: 15
 
9
Cian Cummins
Trinity College Dublin
Total Publications: 23