Type

Journal Article

Authors

Michael A. Morris
Justin D. Holmes
Matthew T Shaw
Ramsankar Senthamaraikannan
Tandra Ghoshal

Subjects

Physics

Topics
iron oxide high aspect ratio spectroscopic techniques aspect ratio silicon oxides iron oxides porous silicon silicon nanowire nanowires etching silicon new materials block copolymers surface morphology inductively coupled plasma

"In situ" hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays. (2012)

Abstract A novel, simple and in situ hard mask technology that can be used to develop high aspect ratio silicon nanopillar and nanowire features on a substrate surface is demonstrated. The technique combines a block copolymer inclusion method that generates nanodot arrays on substrate and an inductively coupled plasma (ICP) etch processing step to fabricate Si nanopillar and nanowire arrays. Iron oxide was found to be an excellent resistant mask over silicon under the selected etching conditions. Features of a very high aspect ratio can be created by this method. The nanopillars have uniform diameter and smooth sidewalls throughout their entire length. The diameter (15-27 nm) and length of the nanopillars can be tuned easily. Different spectroscopic and microscopic techniques were used to examine the morphology and size, surface composition and crystallinity of the resultant patterns. The methodology developed may have important technological applications and provide an inexpensive manufacturing route to nanodimensioned topographical patterns. The high aspect ratio of the features may have importance in the area of photonics and the photoluminescence properties are found to be similar to those of surface-oxidized silicon nanocrystals and porous silicon.
Collections Ireland -> University College Cork -> PubMed
Ireland -> University College Cork -> College of Science, Engineering and Food Science
Ireland -> University College Cork -> Tyndall National Institute
Ireland -> University College Cork -> Tyndall National Institute - Journal Articles
Ireland -> University College Cork -> Chemistry
Ireland -> University College Cork -> Chemistry - Journal Articles
Ireland -> University College Cork -> Research Institutes and Centres

Full list of authors on original publication

Michael A. Morris, Justin D. Holmes, Matthew T Shaw, Ramsankar Senthamaraikannan, Tandra Ghoshal

Experts in our system

1
Michael A. Morris
University College Cork
Total Publications: 164
 
2
Justin D. Holmes
University College Cork
Total Publications: 287
 
3
Matthew T Shaw
University College Cork
Total Publications: 24
 
4
Ramsankar Senthamaraikannan
University College Cork
Total Publications: 12
 
5
Tandra Ghoshal
University College Cork
Total Publications: 32