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Type

Journal Article

Authors

Georg S Duesberg
Andreas Hirsch
Mario Marcia
Maria O'Brien
Nina C Berner
Conor Patrick Cullen
Toby Hallam
Christian Wirtz

Subjects

Chemistry

Topics
reactivity layers atomic layer deposition materials chalcogenides two dimensional organic transition metal

Atomic layer deposition on 2D transition metal chalcogenides: layer dependent reactivity and seeding with organic ad-layers. (2015)

Abstract This commmunication presents a study of atomic layer deposition of Al2O3 on transition metal dichalcogenide (TMD) two-dimensional films which is crucial for use of these promising materials for electronic applications. Deposition of Al2O3 on pristine chemical vapour deposited MoS2 and WS2 crystals is demonstrated. This deposition is dependent on the number of TMD layers as there is no deposition on pristine monolayers. In addition, we show that it is possible to reliably seed the deposition, even on the monolayer, using non-covalent functionalisation with perylene derivatives as anchor unit.
Url http://www.ncbi.nlm.nih.gov/pubmed/26419287
Collections Ireland -> Trinity College Dublin -> PubMed

Full list of authors on original publication

Georg S Duesberg, Andreas Hirsch, Mario Marcia, Maria O'Brien, Nina C Berner, Conor Patrick Cullen, Toby Hallam, Christian Wirtz

Experts in our system

1
Georg Duesberg
Trinity College Dublin
Chemistry Physics
Total Publications: 116
 
2
Maria O'Brien
Trinity College Dublin
Chemistry Physics
Total Publications: 7
 
3
Nina C Berner
Trinity College Dublin
Chemistry Physics
Total Publications: 20
 
4
Conor P Cullen
University College Cork
Chemistry Physics
Total Publications: 8
 
5
Toby Hallam
Trinity College Dublin
Chemistry Physics
Total Publications: 20