Type

Journal Article

Authors

Kangho Lee
Niall Mcevoy
Shishir Kumar
Georg Duesberg

Subjects

Chemistry

Topics
physical chemistry graphene nanoscience materials electronic structure x ray surface chemistry raman spectroscopy chemical vapour deposition

The Effect of Downstream Plasma Treatments on Graphene Surfaces (2011)

Abstract This paper reports on the effects of growth, transfer and annealing procedures on graphene grown by chemical vapour deposition. A combination of Raman spectroscopy, electrical measurements, atomic force microscopy, and x-ray photoemission spectroscopy allowed for the study of inherent characteristics and electronic structure of graphene films. Contributions from contaminants and surface inhomogeneities such as ripples were also examined. A new cleaning and reconstruction process for graphene, based on plasma treatments and annealing is presented, opening a new pathway for control over the surface chemistry of graphene films. The method has been successfully used on contacted graphene samples, demonstrating its potential for in-situ cleaning, passivation and interface engineering of graphene devices.
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Full list of authors on original publication

Kangho Lee, Niall Mcevoy, Shishir Kumar, Georg Duesberg

Experts in our system

1
Kangho Lee
Trinity College Dublin
Total Publications: 11
 
2
Niall Mcevoy
Trinity College Dublin
Total Publications: 54
 
3
Georg Duesberg
Trinity College Dublin
Total Publications: 116